Nanometrics Wins Multi-System Order for Integrated Metrology
Major Korean Memory Manufacturer Chooses Nanometrics for CMP Process Control
Nanometrics Incorporated (Nasdaq:NANO), a leading supplier of advanced metrology systems, announced that its IMPULSE® integrated metrology optical critical dimension (OCD) and film analysis system has been selected by a major Korean memory manufacturer for chemical mechanical planarization (CMP) process control. The decision makes the Nanometrics IMPULSE system ?tool-of-record? for CMP control of NAND Flash memory in high-volume manufacturing at the 2x nm node. The IMPULSE was selected over competitive offerings following an extended technical evaluation.
?Today's demands on CMP process control absolutely require integrated solutions,? said Steve Bradley, Director of Nanometrics' Integrated Metrology Business Unit. ?The selection of the IMPULSE for this leading-edge application is evidence of our product's high throughput, excellent reliability, extendibility, and seamless integration onto the CMP platform, as well as the customer's confidence in Nanometrics' global service and applications support teams.?
?The selection of our integrated metrology product combined with an earlier decision in favor of our fully-automated Atlas OCD platform firmly establishes Nanometrics as the principle supplier of OCD products to this customer for advanced technology process control metrology,? said Dr. Timothy J. Stultz, president and chief executive officer. ?By working closely with our customers on product roadmaps and aligning our product development with their requirements, we benefit from long term partnerships while we contribute to their advanced technology development and production ramps.?
Nanometrics is a leading provider of advanced, high-performance process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices and solar photovoltaics. Nanometrics' automated and integrated metrology systems measure critical dimensions, device structures, overlay registration, topography and various thin film properties, including film thickness as well as optical, electrical and material properties. The company's process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced wafer-scale packaging applications. Nanometrics' systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide.
More about NANO at www.nanometrics.com.
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